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High-precision spin coater used in liquid, surface film for silicon wafers, glass, ceramics and plate surface coater process.
| Condition | New | Place of Origin | Beijing China (Mainland) |
|---|---|---|---|
| Model Number | T100 | Voltage | 220V/110V |
| Power(W) | 120W | Weight | 25KG |
| Dimension(L*W*H) | 30*40*30CM | Certification | CE/ROSH/CCC |
| Warranty | 1 year | Model | high precision spin coater |
| Speed | 300--10000rmp | Subtrate diameter | 4 inch |
| Details | High-precision spin coater used in liquid, surface film for silicon wafers, glass, ceramics and plate surface coater process. |
| Packaging Detail | export wooden packing. |
|---|---|
| Delivery Detail | 10 working days |
Product Description
Mainly used in liquid, gel formation in the surface film for silicon wafers, glass, ceramics and plate surface coating process. In research, education, production applications.
Specification
Single-phase AC power supply: 220V/110V .50Hz
Motor power: 120W
Rotary vacuum suction cup diameter: 4 inches (102mm, the standard configuration)
Optional configuration: diameter 10-150mm substrate orders accepted.
Speed: 300 - 10,000 rpm / min.
Can set the time :1 --- 9999 seconds.
Standard Packaging: Size: 260mm wide x 350mm deep x 260 mm high
Optional spares:
1 60L / min with no-oil pump
2 special vacuum suction (6 inch, 3 inch, 2 inch, 1 inch and smaller)
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