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1.It overcomes anode disappear·2.It eliminate the abnormal arc discharge of target·3.It can deposit TiN,TiC,TiCN,TiAIN,CrN
| Condition | New | Type | sputtering coating machine |
|---|---|---|---|
| Substrate | multi materials | Coating | Vacuum Coating |
| Place of Origin | Guangdong China (Mainland) | Details | 1.It overcomes anode disappear · 2.It eliminate the abnormal arc discharge of target · 3.It can deposit TiN,TiC,TiCN,TiAIN,CrN |
| Packaging Detail | plastic first then container |
|---|---|
| Delivery Detail | 10-45dys |
medium frequency magnetron sputtering coating machine
/film plating machine
medium frequencymagnetron sputtering coating technology has became the mainstream of the sputtering caoting, its advantage
compare woth the DC magnetron sputtering coating is as follows:
1. It overcomes the anode disappearance
2. It weaken or eliminate the abnormal arc discharge of target, therefore, it improves the stability of the sputtering process, and
at the same time improve the deposition rate of the dielectric film.
3. Our supplier invent the flat target,cylinder target, twin target and various structures of the MF sputtering target. It is widely used
in watchband, watchcases, mobile shell, hard wares, tableware etc. It can deposit TiN,TiC,TiCN,TiAIN,CrN etc decorative coatings.
