Magnetron Sputtering Machine for Glass Bottles/Jars

1.Size:1000 multiply by H1000mm, 2.Independent R &D team, 3.Occupy space:W3m multiply by L3m - details see: https://www.machineto.com/magnetron-sputtering-machine-for-glass-bottles-jars-10084029

Condition:New	Machine Type:Glass Coating Machine	Place of Origin:Shanghai China (Mainland)	Brand Name:Vakia
Model Number:Vakia-MSC-1200	Voltage:380v	Power(W):50kw	Dimension(LWH):4X5X2
Weight:6t	Certification:ISO9001 :2008	Warranty:one year	After-sales Service Provided:Engineers available to service machinery overseas
Color:can be customized	Materials can be coated:plastic,glass,resin,etc	Size:1000mm times 1000mm	Type:Vertical
Certificated:ISO9001 :2008

1.Product Features

1) film thickness controllability and well repeatability,can be a reliable system of pre-plated thickness of the films and sputtering in a larger surface of uniform film;

2) The adhesion of the film and the substrate is very well. Some of the high energy of sputtered atoms to produce different levels of injection phenomenon, pseudo-diffusion layer formed on the substrate layer of sputtered atoms and substrate atoms fused with each other;

3) Preparation of special material of the film, you can use different materials and sputtering hybrid film, compound film,also can be sputtered into the TiN imitation gold film.

2.Main Technical Parameters

Model and Main Technical Parameters of VAKIA-DSC Series Vacuum Magnetron Sputtering Coating Machine
Performance/Model	VAKIA-DSC -700	VAKIA-DSC -900	VAKIA-DSC -1000	VAKIA-DSC -1250	VAKIA-DSC -1400	VAKIA-DSC -1600
Size of coating chamber	700*H900mm	900*H1100mm	1000*H1200mm	1250*H1350mm	1400*H1600mm	1600*H1800mm
Power supply type	Filament power supply, pulse bias power supply, DC magnetron power supply, intermediate frequency magnetron power supply, radio frequency magnetron power supply, linear ionization source
Structure of vacuum chamber	Vertical double door, vertical front door structure, rear air exhaust system
Material of vacuum chamber	High-quality stainless steel cavity
Limit vacuum	6.0*10-4Pa
Pump-down time (no-load)	Pump the atmosphere to 8.0*10^-3>Pa ≤15 minutes
Vacuum acquisition system	Diffusion pump or molecular pump + Roots pump + Mechanical pump + rotary vane pump (the specific model can be configured according to customer requirements)
Coating mode	Magnetron sputtering coating
Film type	Metal film, reactive film, compound film, multilayer film and semiconductor film
Magnetron target type	Rectangular magnetron target, cylindrical magnetron target and twin magnetron targets
Magnetron supply power and number of magnetron targets	Select according to different coating process and customer requirements
Bias power supply	10KW/1 unit	20KW/1 unit	20KW/1 unit	30KW/1 unit	40KW/1 unit	50KW/1unit
Rotating mode of workpiece turntable	Planetary revolution and autorotation, variable frequency speed regulation (controllable and adjustable)
Process gas	3-path or 4-path process gas flow control and display system, selective automatic gassing system
Cooling mode	Water circulation cooling mode, cooling water tower or industrial water cooler or deep cooling system. (Provided by customers)
Control mode	Manual/automatic integration mode, touch screen operation, PLC or computer control
Total power	30KW	35KW	40KW	50KW	65KW	80KW
Alarm and protection	Alarm water shortage, overcurrent and over-voltage, open circuit and other abnormal conditions of pumps, targets and so on and execute relevant protective measures and electric interlock function
Equipment area	W2m*L3m	W2.5m*L3.5m	W3m*L4m	W4m*L5m	W4.5m*L6m	W5m*L7m
Other technical parameters	Water Pressure ≥0.2MPa, Water Temperature ≤25°C, Air Pressure: 0.5-0.8MPa
Remarks	The specific configuration of coating equipment can be designed according to process requirements of coating products