E-BEAM Evaporator
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E-Beam & Thermal Evaporating System
| Application | E-BEAM,THERMAL Coating | Power Source | Electric |
|---|---|---|---|
| Process | E-BEAM,THERMAL | Place of Origin | Gyeonggi-do South Korea |
| Model Number | MEP 5000 | Details | E-Beam & Thermal Evaporating System |
| Packaging Detail | Wooden and isothermal-isohumidity control Packing |
|---|---|
| Delivery Detail | Negotiation |
PRODUCT SHEET
MEP5000 High Precision Electron Beam Evaporator System is a
batch-production equipment dedicated to the Lift-Off & Conformal process for
power IC, LED device & MEMS with precision line-width
requirement.
APPLICATION
Metal Coating
Metal Alloy Coating
FEATURES
| Sample: Si wafer, Sapphire wafer etc.
| Sample Size & Capacity: Max. 6inch*12pcs
| High Vacuum Pumping (Cryo + Rotary)
- Ultimate Pressure: 1X10-6 Torr within 30 minutes
| Substrate Heating
- Max. Temperature: 200 Degree on the sample surface
| Substrate Rotation & Revolution
- Self rotating dome (1ea)
-Planetaryrotatingdome(3ea)
- Easy exchangeable dome
- RPM Control: 10-50RPM
| Electron Beam Source with Power supply
- 25cc crucible X 6ea
- 10kW Power supply
| Fully Automation Control System using PC interfacing
| Deposition Material : General Metal & Oxide
| Selective Processing
- Lift Off Process & conformal process
| Film Uniformity : <±5% for WIW, WTW and RTR
| Multi Layer(6layer) Evaporation Process Available
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