AZO film coating equipment
Price on request
Pricing is provided on request — use the quote form below.
- Port
- Shengzhen
- Minimum Order Quantity
- 1 Set/Sets
- Supply Ability
- 12 Set/Sets per Year
- Payment Terms
- L/C,T/T
Price on request
Pricing is provided on request — use the quote form below.
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AZO film coating equipment:·1.Passed the ISQ9000.·2.It has 7 vacuum chambers .·3.Advanced design.
| Type | Coating Production Line | Substrate | Steel |
|---|---|---|---|
| Coating | Vacuum Coating | Place of Origin | Hunan China (Mainland) |
| certificate | ISO9000 | Details | AZO film coating equipment: · 1.Passed the ISQ9000. · 2.It has 7 vacuum chambers . · 3.Advanced design. |
| Packaging Detail | Customs Standard Packaging |
|---|---|
| Delivery Detail | 150-180 days after payment |
The horizontal/vertical continuous magnetron sputtering AZO film coating equipment has 7 vacuum chambers, Part 1 is the entrance chamber; part 2 is entrance buffering chamber; part 3is the entrance transfer chamber, part 4is the process chamber; part 5 is the exit transfer chamber; part 6 is the exit buffering chamber; part 7 is the exit chamber; Two pairs of mid-frequency dual Si target which is controlled by PUC04 closed loop ring form the high-quality SiO2 isolating layer; 10 pairs of column AZO target realize the high-quality AZO transparent conductive film; the dimension of processing in design is the plane base plate materials of 1100mm wide and 1400mm long. The cycle of production and processing can be optimized to 100-180 second. The production has the advanced design which uses the molecular pump to form the atmosphere separation by pumping. Also, it has used the turbo-molecular pump to get high-efficiency isolation, stable pumping speed and even distribution if air.
1. Technical characteristics of productionline
| equipment type | horizontal/vertical continuous magnetron sputtering coating line |
| dimension of carrier | designed according to the substrate of 1×1100mm× 1400mm(×3mm (can be customized according to requirements ) |
| design requirements of film uniformity | in area of effective deposit, the uniformity of film thickness ≤±5% |
| cathode structure | adopt the mid-frequency dual rotary cathode |
| Driving mode | adopt the small vertial vehicle which is driven by double friction to load the carrier (vertical)or magnetic steering friction drive(horizontal) |
| realization of coating technology | adopt the ZnO: A1 ceramic target and reactive sputtering deposit technology |
| Control of coating temperature | adopt the stainless sheathed heating device (can use the light tube to heat according to requirements of customers); the highest temperature is 350Degrees Celsius. Within the range from ambient temperature to 400 Degrees Celsius, it can be designed according the any setting; the stability of control is ±5Degrees Celsius |
| control system | the control system can realize the man-machine dialogue and carry out necessary intervention in production process. During operating process, there are alarm indication and error display; the alarm display can indicate the correct operation and troubleshooting for operators. |
2.Main technical parameters
| Final vacuum | 6 × 1 0E-4 Pa |
| Average production cycle | 80-180 seconds / frame |
| Carrier size | 1100 mm× 1400mm (can be customized on request) |
| Film uniformity | ±5% |
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